Appearance: Transparent liquid

Application: It is used to fabricate ultra thick (50-200um) and medium thickness (10-50um) MEMS microstructures, as well as ordinary film thickness (0.3-10um) of various shapes such as holes and characters; suitable for I, G lines, X-ray, e-beam exposure

Appearance: Transparent liquid

Application: 用于制造超厚（50-200um）和中厚（10-50um）MEMS微结构，以及普通膜厚（0.3-10um）的各种挖洞、字符等型貌的光刻线条；适合i、G线，X-Ray，E-beam曝光

Appearance: 透明液体

Application: The negative photoresist is protected by insulation in the yellow light process of TP ITO

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